Automated CVD Equipment

Annealsys Direct Injection Liquid (DLI) tank systems use state-of-the-art DLI vaporizers that allow the use of low vapor pressure and thermally unstable chemical precursors.

The equipment is used for deposition processes of transition metal oxides, multiple metal oxides, and also 2D materials including graphene, hexagonal boron nitride and transition metal dicalcogenides (TMD).

Equipment is available for substrates up to 50mm, 100mm or 200mm in diameter.

Our DLI deposition systems offer multi-process capabilities within the same chamber: DLI-CVD, DLI-ALD, MOCVD, pulse pressure CVD and even rapid in-situ thermal processing (RTP) for the MC-050.