Automated MBE Equipment

We have a portfolio of Riber-branded research systems that allow a wide range of epitaxial layers to be deposited on wafers up to 4 inches in diameter. These reactors, which include the Compact 21, are capable of depositing high quality films of arsenides, phosphides and antimonides; gallium nitride; cadmium and mercury telluride; Material II-VI; silicon germanium; and metals and oxides.

In 1988, Riber launched the first MBE production system in the world, and today there are three fully automated machines: MBE 49, MBE 6000 and MBE 7000. Not to mention the flagship system, the MBE7000, which allows the deposition of almost 24,000 6-inch wafers per year