Direct Write Systems Ultra

Heidelberg Instruments’ ULTRA laser mask writer is based on a technology that has evolved from our well-established line of volume pattern generators. The ULTRA has been specifically designed and optimized for the production of semiconductor photomasks at the 150 nm design node. Our mask builder features speed, advanced data path, high accuracy and structure uniformity, and sophisticated and extremely accurate alignment functions. At the same time, the ULTRA represents an economical solution with a low cost of ownership. With its modern and compact construction, it is easily incorporated into an existing mask infrastructure.